Sputter-deposited ZrO2 gate dielectric on high mobility epitaxial-GaAs/Ge channel material for advanced CMOS applications
10.4028/www.scientific.net/KEM.443.504
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2014
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sg-nus-scholar.10635-842172023-10-25T22:26:51Z Sputter-deposited ZrO2 gate dielectric on high mobility epitaxial-GaAs/Ge channel material for advanced CMOS applications Dalapati, G.K. Kumar, A. Wong, A.S.W. Kumar, M.K. Chia, C.K. Ho, G.W. Chi, D. ELECTRICAL & COMPUTER ENGINEERING Epi-GaAs Frequency dispersion GaAs-MOS capacitor High-k III-V semiconductor 10.4028/www.scientific.net/KEM.443.504 Key Engineering Materials 443 504-509 KEMAE 2014-10-07T04:50:09Z 2014-10-07T04:50:09Z 2010 Conference Paper Dalapati, G.K., Kumar, A., Wong, A.S.W., Kumar, M.K., Chia, C.K., Ho, G.W., Chi, D. (2010). Sputter-deposited ZrO2 gate dielectric on high mobility epitaxial-GaAs/Ge channel material for advanced CMOS applications. Key Engineering Materials 443 : 504-509. ScholarBank@NUS Repository. https://doi.org/10.4028/www.scientific.net/KEM.443.504 0878492674 10139826 http://scholarbank.nus.edu.sg/handle/10635/84217 000283804900085 Scopus |
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National University of Singapore |
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Asia |
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Singapore Singapore |
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| topic |
Epi-GaAs Frequency dispersion GaAs-MOS capacitor High-k III-V semiconductor |
| spellingShingle |
Epi-GaAs Frequency dispersion GaAs-MOS capacitor High-k III-V semiconductor Dalapati, G.K. Kumar, A. Wong, A.S.W. Kumar, M.K. Chia, C.K. Ho, G.W. Chi, D. Sputter-deposited ZrO2 gate dielectric on high mobility epitaxial-GaAs/Ge channel material for advanced CMOS applications |
| description |
10.4028/www.scientific.net/KEM.443.504 |
| author2 |
ELECTRICAL & COMPUTER ENGINEERING |
| author_facet |
ELECTRICAL & COMPUTER ENGINEERING Dalapati, G.K. Kumar, A. Wong, A.S.W. Kumar, M.K. Chia, C.K. Ho, G.W. Chi, D. |
| format |
Conference or Workshop Item |
| author |
Dalapati, G.K. Kumar, A. Wong, A.S.W. Kumar, M.K. Chia, C.K. Ho, G.W. Chi, D. |
| author_sort |
Dalapati, G.K. |
| title |
Sputter-deposited ZrO2 gate dielectric on high mobility epitaxial-GaAs/Ge channel material for advanced CMOS applications |
| title_short |
Sputter-deposited ZrO2 gate dielectric on high mobility epitaxial-GaAs/Ge channel material for advanced CMOS applications |
| title_full |
Sputter-deposited ZrO2 gate dielectric on high mobility epitaxial-GaAs/Ge channel material for advanced CMOS applications |
| title_fullStr |
Sputter-deposited ZrO2 gate dielectric on high mobility epitaxial-GaAs/Ge channel material for advanced CMOS applications |
| title_full_unstemmed |
Sputter-deposited ZrO2 gate dielectric on high mobility epitaxial-GaAs/Ge channel material for advanced CMOS applications |
| title_sort |
sputter-deposited zro2 gate dielectric on high mobility epitaxial-gaas/ge channel material for advanced cmos applications |
| publishDate |
2014 |
| url |
http://scholarbank.nus.edu.sg/handle/10635/84217 |
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1781784432550608896 |