Influence of plasma treatment of ITO surface on the growth and properties of hole transport layer and the device performance of OLEDs

Influence of plasma treatment of ITO surface on the growth and properties of hole transport layer and the device performance of OLEDs

10.1016/j.orgel.2007.08.002

Saved in:
Bibliographic Details
Main Authors: Huang, Z.H., Zeng, X.T., Sun, X.Y., Kang, E.T., Fuh, J.Y.H., Lu, L.
Other Authors: MECHANICAL ENGINEERING
Format: Article
Published: 2014
Subjects:
Indium tin oxide
Morphology
OLEDs
Plasma
Surface energy
Surface treatment
Online Access:http://scholarbank.nus.edu.sg/handle/10635/85320
Tags: Add Tag
No Tags, Be the first to tag this record!
Institution: National University of Singapore
id sg-nus-scholar.10635-85320
record_format dspace
spelling sg-nus-scholar.10635-853202024-11-11T07:25:39Z Influence of plasma treatment of ITO surface on the growth and properties of hole transport layer and the device performance of OLEDs Huang, Z.H. Zeng, X.T. Sun, X.Y. Kang, E.T. Fuh, J.Y.H. Lu, L. MECHANICAL ENGINEERING CHEMICAL & BIOMOLECULAR ENGINEERING Indium tin oxide Morphology OLEDs Plasma Surface energy Surface treatment 10.1016/j.orgel.2007.08.002 Organic Electronics: physics, materials, applications 9 1 51-62 2014-10-07T09:06:38Z 2014-10-07T09:06:38Z 2008-02 Article Huang, Z.H., Zeng, X.T., Sun, X.Y., Kang, E.T., Fuh, J.Y.H., Lu, L. (2008-02). Influence of plasma treatment of ITO surface on the growth and properties of hole transport layer and the device performance of OLEDs. Organic Electronics: physics, materials, applications 9 (1) : 51-62. ScholarBank@NUS Repository. https://doi.org/10.1016/j.orgel.2007.08.002 15661199 http://scholarbank.nus.edu.sg/handle/10635/85320 000252942800007 Scopus
institution National University of Singapore
building NUS Library
continent Asia
country Singapore
Singapore
content_provider NUS Library
collection ScholarBank@NUS
topic Indium tin oxide
Morphology
OLEDs
Plasma
Surface energy
Surface treatment
spellingShingle Indium tin oxide
Morphology
OLEDs
Plasma
Surface energy
Surface treatment
Huang, Z.H.
Zeng, X.T.
Sun, X.Y.
Kang, E.T.
Fuh, J.Y.H.
Lu, L.
Influence of plasma treatment of ITO surface on the growth and properties of hole transport layer and the device performance of OLEDs
description 10.1016/j.orgel.2007.08.002
author2 MECHANICAL ENGINEERING
author_facet MECHANICAL ENGINEERING
Huang, Z.H.
Zeng, X.T.
Sun, X.Y.
Kang, E.T.
Fuh, J.Y.H.
Lu, L.
format Article
author Huang, Z.H.
Zeng, X.T.
Sun, X.Y.
Kang, E.T.
Fuh, J.Y.H.
Lu, L.
author_sort Huang, Z.H.
title Influence of plasma treatment of ITO surface on the growth and properties of hole transport layer and the device performance of OLEDs
title_short Influence of plasma treatment of ITO surface on the growth and properties of hole transport layer and the device performance of OLEDs
title_full Influence of plasma treatment of ITO surface on the growth and properties of hole transport layer and the device performance of OLEDs
title_fullStr Influence of plasma treatment of ITO surface on the growth and properties of hole transport layer and the device performance of OLEDs
title_full_unstemmed Influence of plasma treatment of ITO surface on the growth and properties of hole transport layer and the device performance of OLEDs
title_sort influence of plasma treatment of ito surface on the growth and properties of hole transport layer and the device performance of oleds
publishDate 2014
url http://scholarbank.nus.edu.sg/handle/10635/85320
_version_ 1821194037297676288

Similar Items