Influence of plasma treatment of ITO surface on the growth and properties of hole transport layer and the device performance of OLEDs

10.1016/j.orgel.2007.08.002

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Bibliographic Details
Main Authors:	Huang, Z.H., Zeng, X.T., Sun, X.Y., Kang, E.T., Fuh, J.Y.H., Lu, L.
Other Authors:	CHEMICAL & BIOMOLECULAR ENGINEERING
Format:	Article
Published:	2014
Subjects:	Indium tin oxide Morphology OLEDs Plasma Surface energy Surface treatment
Online Access:	http://scholarbank.nus.edu.sg/handle/10635/85320
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Institution:	National University of Singapore

id	sg-nus-scholar.10635-85320
record_format	dspace
spelling	sg-nus-scholar.10635-853202023-10-27T08:36:54Z Influence of plasma treatment of ITO surface on the growth and properties of hole transport layer and the device performance of OLEDs Huang, Z.H. Zeng, X.T. Sun, X.Y. Kang, E.T. Fuh, J.Y.H. Lu, L. CHEMICAL & BIOMOLECULAR ENGINEERING MECHANICAL ENGINEERING Indium tin oxide Morphology OLEDs Plasma Surface energy Surface treatment 10.1016/j.orgel.2007.08.002 Organic Electronics: physics, materials, applications 9 1 51-62 2014-10-07T09:06:38Z 2014-10-07T09:06:38Z 2008-02 Article Huang, Z.H., Zeng, X.T., Sun, X.Y., Kang, E.T., Fuh, J.Y.H., Lu, L. (2008-02). Influence of plasma treatment of ITO surface on the growth and properties of hole transport layer and the device performance of OLEDs. Organic Electronics: physics, materials, applications 9 (1) : 51-62. ScholarBank@NUS Repository. https://doi.org/10.1016/j.orgel.2007.08.002 15661199 http://scholarbank.nus.edu.sg/handle/10635/85320 000252942800007 Scopus
institution	National University of Singapore
building	NUS Library
continent	Asia
country	Singapore Singapore
content_provider	NUS Library
collection	ScholarBank@NUS
topic	Indium tin oxide Morphology OLEDs Plasma Surface energy Surface treatment
spellingShingle	Indium tin oxide Morphology OLEDs Plasma Surface energy Surface treatment Huang, Z.H. Zeng, X.T. Sun, X.Y. Kang, E.T. Fuh, J.Y.H. Lu, L. Influence of plasma treatment of ITO surface on the growth and properties of hole transport layer and the device performance of OLEDs
description	10.1016/j.orgel.2007.08.002
author2	CHEMICAL & BIOMOLECULAR ENGINEERING
author_facet	CHEMICAL & BIOMOLECULAR ENGINEERING Huang, Z.H. Zeng, X.T. Sun, X.Y. Kang, E.T. Fuh, J.Y.H. Lu, L.
format	Article
author	Huang, Z.H. Zeng, X.T. Sun, X.Y. Kang, E.T. Fuh, J.Y.H. Lu, L.
author_sort	Huang, Z.H.
title	Influence of plasma treatment of ITO surface on the growth and properties of hole transport layer and the device performance of OLEDs
title_short	Influence of plasma treatment of ITO surface on the growth and properties of hole transport layer and the device performance of OLEDs
title_full	Influence of plasma treatment of ITO surface on the growth and properties of hole transport layer and the device performance of OLEDs
title_fullStr	Influence of plasma treatment of ITO surface on the growth and properties of hole transport layer and the device performance of OLEDs
title_full_unstemmed	Influence of plasma treatment of ITO surface on the growth and properties of hole transport layer and the device performance of OLEDs
title_sort	influence of plasma treatment of ito surface on the growth and properties of hole transport layer and the device performance of oleds
publishDate	2014
url	http://scholarbank.nus.edu.sg/handle/10635/85320
_version_	1781784645577211904

Influence of plasma treatment of ITO surface on the growth and properties of hole transport layer and the device performance of OLEDs

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