Oxygen-vacancy-mediated negative differential resistance in la and Mg co-substituted BiFeO 3 thin film

10.1063/1.3668119

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Bibliographic Details
Main Authors:	Ke, Q., Kumar, A., Lou, X., Zeng, K., Wang, J.
Other Authors:	MATERIALS SCIENCE AND ENGINEERING
Format:	Article
Published:	2014
Online Access:	http://scholarbank.nus.edu.sg/handle/10635/85532
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Institution:	National University of Singapore

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Summary:	10.1063/1.3668119

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