The resistive switching in TiO2 films studied by conductive atomic force microscopy and Kelvin probe force microscopy

The resistive switching in TiO2 films studied by conductive atomic force microscopy and Kelvin probe force microscopy

10.1063/1.4818119

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Bibliographic Details
Main Authors: Du, Y., Kumar, A., Pan, H., Zeng, K., Wang, S., Yang, P., Wee, A.T.S.
Other Authors: MECHANICAL ENGINEERING
Format: Article
Published: 2014
Online Access:http://scholarbank.nus.edu.sg/handle/10635/85776
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Institution: National University of Singapore

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http://scholarbank.nus.edu.sg/handle/10635/85776

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