BiFeO3 thin films deposited on LaNiO3-buffered SiO2/Si substrate

10.1111/j.1551-2916.2009.03579.x

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Bibliographic Details
Main Authors:	Wu, J., Wang, J.
Other Authors:	MATERIALS SCIENCE AND ENGINEERING
Format:	Article
Published:	2014
Online Access:	http://scholarbank.nus.edu.sg/handle/10635/86195
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Institution:	National University of Singapore

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spelling	sg-nus-scholar.10635-861952023-10-29T22:14:32Z BiFeO3 thin films deposited on LaNiO3-buffered SiO2/Si substrate Wu, J. Wang, J. MATERIALS SCIENCE AND ENGINEERING 10.1111/j.1551-2916.2009.03579.x Journal of the American Ceramic Society 93 5 1422-1426 2014-10-07T09:47:51Z 2014-10-07T09:47:51Z 2010-05 Article Wu, J., Wang, J. (2010-05). BiFeO3 thin films deposited on LaNiO3-buffered SiO2/Si substrate. Journal of the American Ceramic Society 93 (5) : 1422-1426. ScholarBank@NUS Repository. https://doi.org/10.1111/j.1551-2916.2009.03579.x 00027820 http://scholarbank.nus.edu.sg/handle/10635/86195 000277083500037 Scopus
institution	National University of Singapore
building	NUS Library
continent	Asia
country	Singapore Singapore
content_provider	NUS Library
collection	ScholarBank@NUS
description	10.1111/j.1551-2916.2009.03579.x
author2	MATERIALS SCIENCE AND ENGINEERING
author_facet	MATERIALS SCIENCE AND ENGINEERING Wu, J. Wang, J.
format	Article
author	Wu, J. Wang, J.
spellingShingle	Wu, J. Wang, J. BiFeO3 thin films deposited on LaNiO3-buffered SiO2/Si substrate
author_sort	Wu, J.
title	BiFeO3 thin films deposited on LaNiO3-buffered SiO2/Si substrate
title_short	BiFeO3 thin films deposited on LaNiO3-buffered SiO2/Si substrate
title_full	BiFeO3 thin films deposited on LaNiO3-buffered SiO2/Si substrate
title_fullStr	BiFeO3 thin films deposited on LaNiO3-buffered SiO2/Si substrate
title_full_unstemmed	BiFeO3 thin films deposited on LaNiO3-buffered SiO2/Si substrate
title_sort	bifeo3 thin films deposited on lanio3-buffered sio2/si substrate
publishDate	2014
url	http://scholarbank.nus.edu.sg/handle/10635/86195
_version_	1781784823155654656

BiFeO3 thin films deposited on LaNiO3-buffered SiO2/Si substrate

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