The influence of In/Cu ratio on electrical properties of CuO:In thin films prepared by plasma-enhanced CVD

The influence of In/Cu ratio on electrical properties of CuO:In thin films prepared by plasma-enhanced CVD

10.1002/cvde.200706645

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Bibliographic Details
Main Authors: Hao, Y., Gong, H.
Other Authors: MATERIALS SCIENCE AND ENGINEERING
Format: Article
Published: 2014
Subjects:
Amorphous
CuO:In
Cupric oxide
Resistivity
Thin film
XPS
Online Access:http://scholarbank.nus.edu.sg/handle/10635/86790
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Institution: National University of Singapore

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http://scholarbank.nus.edu.sg/handle/10635/86790

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