The influence of In/Cu ratio on electrical properties of CuO:In thin films prepared by plasma-enhanced CVD
10.1002/cvde.200706645
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sg-nus-scholar.10635-867902024-11-10T12:35:17Z The influence of In/Cu ratio on electrical properties of CuO:In thin films prepared by plasma-enhanced CVD Hao, Y. Gong, H. MATERIALS SCIENCE AND ENGINEERING Amorphous CuO:In Cupric oxide Resistivity Thin film XPS 10.1002/cvde.200706645 Chemical Vapor Deposition 14 1-2 9-13 CVDEF 2014-10-07T09:54:50Z 2014-10-07T09:54:50Z 2008-02 Article Hao, Y., Gong, H. (2008-02). The influence of In/Cu ratio on electrical properties of CuO:In thin films prepared by plasma-enhanced CVD. Chemical Vapor Deposition 14 (1-2) : 9-13. ScholarBank@NUS Repository. https://doi.org/10.1002/cvde.200706645 09481907 http://scholarbank.nus.edu.sg/handle/10635/86790 000253749400001 Scopus |
| institution |
National University of Singapore |
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NUS Library |
| continent |
Asia |
| country |
Singapore Singapore |
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NUS Library |
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ScholarBank@NUS |
| topic |
Amorphous CuO:In Cupric oxide Resistivity Thin film XPS |
| spellingShingle |
Amorphous CuO:In Cupric oxide Resistivity Thin film XPS Hao, Y. Gong, H. The influence of In/Cu ratio on electrical properties of CuO:In thin films prepared by plasma-enhanced CVD |
| description |
10.1002/cvde.200706645 |
| author2 |
MATERIALS SCIENCE AND ENGINEERING |
| author_facet |
MATERIALS SCIENCE AND ENGINEERING Hao, Y. Gong, H. |
| format |
Article |
| author |
Hao, Y. Gong, H. |
| author_sort |
Hao, Y. |
| title |
The influence of In/Cu ratio on electrical properties of CuO:In thin films prepared by plasma-enhanced CVD |
| title_short |
The influence of In/Cu ratio on electrical properties of CuO:In thin films prepared by plasma-enhanced CVD |
| title_full |
The influence of In/Cu ratio on electrical properties of CuO:In thin films prepared by plasma-enhanced CVD |
| title_fullStr |
The influence of In/Cu ratio on electrical properties of CuO:In thin films prepared by plasma-enhanced CVD |
| title_full_unstemmed |
The influence of In/Cu ratio on electrical properties of CuO:In thin films prepared by plasma-enhanced CVD |
| title_sort |
influence of in/cu ratio on electrical properties of cuo:in thin films prepared by plasma-enhanced cvd |
| publishDate |
2014 |
| url |
http://scholarbank.nus.edu.sg/handle/10635/86790 |
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1821217054369251328 |