Epitaxial Y-stabilized ZrO2 films on silicon: Dynamic growth process and interface structure
10.1063/1.1467970
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sg-nus-scholar.10635-965122023-10-30T07:29:27Z Epitaxial Y-stabilized ZrO2 films on silicon: Dynamic growth process and interface structure Wang, S.J. Ong, C.K. PHYSICS 10.1063/1.1467970 Applied Physics Letters 80 14 2541-2543 APPLA 2014-10-16T09:24:17Z 2014-10-16T09:24:17Z 2002-04-08 Article Wang, S.J., Ong, C.K. (2002-04-08). Epitaxial Y-stabilized ZrO2 films on silicon: Dynamic growth process and interface structure. Applied Physics Letters 80 (14) : 2541-2543. ScholarBank@NUS Repository. https://doi.org/10.1063/1.1467970 00036951 http://scholarbank.nus.edu.sg/handle/10635/96512 000174765900037 Scopus |
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10.1063/1.1467970 |
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PHYSICS Wang, S.J. Ong, C.K. |
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Article |
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Wang, S.J. Ong, C.K. |
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Wang, S.J. Ong, C.K. Epitaxial Y-stabilized ZrO2 films on silicon: Dynamic growth process and interface structure |
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Wang, S.J. |
title |
Epitaxial Y-stabilized ZrO2 films on silicon: Dynamic growth process and interface structure |
title_short |
Epitaxial Y-stabilized ZrO2 films on silicon: Dynamic growth process and interface structure |
title_full |
Epitaxial Y-stabilized ZrO2 films on silicon: Dynamic growth process and interface structure |
title_fullStr |
Epitaxial Y-stabilized ZrO2 films on silicon: Dynamic growth process and interface structure |
title_full_unstemmed |
Epitaxial Y-stabilized ZrO2 films on silicon: Dynamic growth process and interface structure |
title_sort |
epitaxial y-stabilized zro2 films on silicon: dynamic growth process and interface structure |
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2014 |
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http://scholarbank.nus.edu.sg/handle/10635/96512 |
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