Evidence for the interfacial reaction between Ni adatoms and H-Si(001) surface

• Main Authors: Zhang, Z., Pan, J.S., Chai, J.W., Zhang, J., Tok, E.S.
• Other Authors: PHYSICS
• Format: Article
• Published: 2014
• Subjects: Interfacial reaction; Nickel silicide; Silicon; X-ray photoelectron spectroscopy (XPS)
• Online Access: http://scholarbank.nus.edu.sg/handle/10635/96529
• Institution: National University of Singapore

10.1016/j.susc.2011.06.023