Indium tin oxide films prepared by radio frequency magnetron sputtering method at a low processing temperature

10.1016/S0040-6090(00)01418-8

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Main Authors: Zhang, K., Zhu, F., Huan, C.H.A., Wee, A.T.S.
Other Authors: PHYSICS
Format: Article
Published: 2014
Online Access:http://scholarbank.nus.edu.sg/handle/10635/96906
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Institution: National University of Singapore
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spelling sg-nus-scholar.10635-969062023-10-30T22:43:17Z Indium tin oxide films prepared by radio frequency magnetron sputtering method at a low processing temperature Zhang, K. Zhu, F. Huan, C.H.A. Wee, A.T.S. PHYSICS 10.1016/S0040-6090(00)01418-8 Thin Solid Films 376 1-2 255-263 THSFA 2014-10-16T09:28:56Z 2014-10-16T09:28:56Z 2000-11-01 Article Zhang, K., Zhu, F., Huan, C.H.A., Wee, A.T.S. (2000-11-01). Indium tin oxide films prepared by radio frequency magnetron sputtering method at a low processing temperature. Thin Solid Films 376 (1-2) : 255-263. ScholarBank@NUS Repository. https://doi.org/10.1016/S0040-6090(00)01418-8 00406090 http://scholarbank.nus.edu.sg/handle/10635/96906 000165207400037 Scopus
institution National University of Singapore
building NUS Library
continent Asia
country Singapore
Singapore
content_provider NUS Library
collection ScholarBank@NUS
description 10.1016/S0040-6090(00)01418-8
author2 PHYSICS
author_facet PHYSICS
Zhang, K.
Zhu, F.
Huan, C.H.A.
Wee, A.T.S.
format Article
author Zhang, K.
Zhu, F.
Huan, C.H.A.
Wee, A.T.S.
spellingShingle Zhang, K.
Zhu, F.
Huan, C.H.A.
Wee, A.T.S.
Indium tin oxide films prepared by radio frequency magnetron sputtering method at a low processing temperature
author_sort Zhang, K.
title Indium tin oxide films prepared by radio frequency magnetron sputtering method at a low processing temperature
title_short Indium tin oxide films prepared by radio frequency magnetron sputtering method at a low processing temperature
title_full Indium tin oxide films prepared by radio frequency magnetron sputtering method at a low processing temperature
title_fullStr Indium tin oxide films prepared by radio frequency magnetron sputtering method at a low processing temperature
title_full_unstemmed Indium tin oxide films prepared by radio frequency magnetron sputtering method at a low processing temperature
title_sort indium tin oxide films prepared by radio frequency magnetron sputtering method at a low processing temperature
publishDate 2014
url http://scholarbank.nus.edu.sg/handle/10635/96906
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