Indium tin oxide films prepared by radio frequency magnetron sputtering method at a low processing temperature
10.1016/S0040-6090(00)01418-8
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sg-nus-scholar.10635-969062023-10-30T22:43:17Z Indium tin oxide films prepared by radio frequency magnetron sputtering method at a low processing temperature Zhang, K. Zhu, F. Huan, C.H.A. Wee, A.T.S. PHYSICS 10.1016/S0040-6090(00)01418-8 Thin Solid Films 376 1-2 255-263 THSFA 2014-10-16T09:28:56Z 2014-10-16T09:28:56Z 2000-11-01 Article Zhang, K., Zhu, F., Huan, C.H.A., Wee, A.T.S. (2000-11-01). Indium tin oxide films prepared by radio frequency magnetron sputtering method at a low processing temperature. Thin Solid Films 376 (1-2) : 255-263. ScholarBank@NUS Repository. https://doi.org/10.1016/S0040-6090(00)01418-8 00406090 http://scholarbank.nus.edu.sg/handle/10635/96906 000165207400037 Scopus |
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10.1016/S0040-6090(00)01418-8 |
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PHYSICS Zhang, K. Zhu, F. Huan, C.H.A. Wee, A.T.S. |
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Zhang, K. Zhu, F. Huan, C.H.A. Wee, A.T.S. |
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Zhang, K. Zhu, F. Huan, C.H.A. Wee, A.T.S. Indium tin oxide films prepared by radio frequency magnetron sputtering method at a low processing temperature |
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Zhang, K. |
title |
Indium tin oxide films prepared by radio frequency magnetron sputtering method at a low processing temperature |
title_short |
Indium tin oxide films prepared by radio frequency magnetron sputtering method at a low processing temperature |
title_full |
Indium tin oxide films prepared by radio frequency magnetron sputtering method at a low processing temperature |
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Indium tin oxide films prepared by radio frequency magnetron sputtering method at a low processing temperature |
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Indium tin oxide films prepared by radio frequency magnetron sputtering method at a low processing temperature |
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indium tin oxide films prepared by radio frequency magnetron sputtering method at a low processing temperature |
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2014 |
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http://scholarbank.nus.edu.sg/handle/10635/96906 |
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