Plasma enhanced chemical vapor deposition and characterization of hydrogenated amorphous SiC films on Si

Materials Science Forum

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Main Authors:	Wang, Y., Lin, J., Feng, Z.C., Chua, S.J., Alfred, C.H.H.
Other Authors:	PHYSICS
Format:	Article
Published:	2014
Online Access:	http://scholarbank.nus.edu.sg/handle/10635/97555
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Institution:	National University of Singapore

id	sg-nus-scholar.10635-97555
record_format	dspace
spelling	sg-nus-scholar.10635-975552024-11-13T13:30:30Z Plasma enhanced chemical vapor deposition and characterization of hydrogenated amorphous SiC films on Si Wang, Y. Lin, J. Feng, Z.C. Chua, S.J. Alfred, C.H.H. PHYSICS Materials Science Forum 338 I/- MSFOE 2014-10-16T09:36:38Z 2014-10-16T09:36:38Z 2000 Article Wang, Y.,Lin, J.,Feng, Z.C.,Chua, S.J.,Alfred, C.H.H. (2000). Plasma enhanced chemical vapor deposition and characterization of hydrogenated amorphous SiC films on Si. Materials Science Forum 338 : I/-. ScholarBank@NUS Repository. 02555476 http://scholarbank.nus.edu.sg/handle/10635/97555 NOT_IN_WOS Scopus
institution	National University of Singapore
building	NUS Library
continent	Asia
country	Singapore Singapore
content_provider	NUS Library
collection	ScholarBank@NUS
description	Materials Science Forum
author2	PHYSICS
author_facet	PHYSICS Wang, Y. Lin, J. Feng, Z.C. Chua, S.J. Alfred, C.H.H.
format	Article
author	Wang, Y. Lin, J. Feng, Z.C. Chua, S.J. Alfred, C.H.H.
spellingShingle	Wang, Y. Lin, J. Feng, Z.C. Chua, S.J. Alfred, C.H.H. Plasma enhanced chemical vapor deposition and characterization of hydrogenated amorphous SiC films on Si
author_sort	Wang, Y.
title	Plasma enhanced chemical vapor deposition and characterization of hydrogenated amorphous SiC films on Si
title_short	Plasma enhanced chemical vapor deposition and characterization of hydrogenated amorphous SiC films on Si
title_full	Plasma enhanced chemical vapor deposition and characterization of hydrogenated amorphous SiC films on Si
title_fullStr	Plasma enhanced chemical vapor deposition and characterization of hydrogenated amorphous SiC films on Si
title_full_unstemmed	Plasma enhanced chemical vapor deposition and characterization of hydrogenated amorphous SiC films on Si
title_sort	plasma enhanced chemical vapor deposition and characterization of hydrogenated amorphous sic films on si
publishDate	2014
url	http://scholarbank.nus.edu.sg/handle/10635/97555
_version_	1821204327021150208

Plasma enhanced chemical vapor deposition and characterization of hydrogenated amorphous SiC films on Si

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