Multi-objective optimization based on robust design for etching process parameters of hard disk drive slider fabrication

• Main Authors: Holimchayachotikul P., Limcharoen A., Leksakul K., Guizzi G.
• 格式: Conference or Workshop Item
• 語言: English
• 出版: 2014
• 在線閱讀: http://www.scopus.com/inward/record.url?eid=2-s2.0-79952607772&partnerID=40&md5=2a090bf380dee8f85db18145aaeaedc1; http://cmuir.cmu.ac.th/handle/6653943832/1481
• 機構: Chiang Mai University

This paper investigated the ability of the etched wall angle and depth controllable. The silicon plates with a patterned wet film photo resistance as a base substrate are used to demonstrate this research. The reactive ion etching (RIE) is main process for hard disk drive slider fabrication. This pr...