Multi-objective optimization based on robust design for etching process parameters of hard disk drive slider fabrication
This paper investigated the ability of the etched wall angle and depth controllable. The silicon plates with a patterned wet film photo resistance as a base substrate are used to demonstrate this research. The reactive ion etching (RIE) is main process for hard disk drive slider fabrication. This pr...
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| Main Authors: | , , , |
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| Format: | Conference or Workshop Item |
| Language: | English |
| Published: |
2014
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| Online Access: | http://www.scopus.com/inward/record.url?eid=2-s2.0-79952607772&partnerID=40&md5=2a090bf380dee8f85db18145aaeaedc1 http://cmuir.cmu.ac.th/handle/6653943832/1481 |
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| Institution: | Chiang Mai University |
| Language: | English |
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