Multi-objective optimization based on robust design for etching process parameters of hard disk drive slider fabrication
This paper investigated the ability of the etched wall angle and depth controllable. The silicon plates with a patterned wet film photo resistance as a base substrate are used to demonstrate this research. The reactive ion etching (RIE) is main process for hard disk drive slider fabrication. This pr...
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| Main Authors: | , , , |
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| 格式: | Conference Proceeding |
| 出版: |
2018
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| 主題: | |
| 在線閱讀: | https://www.scopus.com/inward/record.uri?partnerID=HzOxMe3b&scp=79952607772&origin=inward http://cmuir.cmu.ac.th/jspui/handle/6653943832/50773 |
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| 機構: | Chiang Mai University |