Multi-objective optimization based on robust design for etching process parameters of hard disk drive slider fabrication

• Main Authors: Pongsak Holimchayachotikul, Alonggot Limcharoen, Komgrit Leksakul, Guido Guizzi
• Format: Conference Proceeding
• Published: 2018
• Subjects: Engineering
• Online Access: https://www.scopus.com/inward/record.uri?partnerID=HzOxMe3b&scp=79952607772&origin=inward; http://cmuir.cmu.ac.th/jspui/handle/6653943832/50773
• Institution: Chiang Mai University

This paper investigated the ability of the etched wall angle and depth controllable. The silicon plates with a patterned wet film photo resistance as a base substrate are used to demonstrate this research. The reactive ion etching (RIE) is main process for hard disk drive slider fabrication. This pr...