Multi-objective optimization based on robust design for etching process parameters of hard disk drive slider fabrication

• المؤلفون الرئيسيون: Holimchayachotikul P., Limcharoen A., Leksakul K., Guizzi G.
• التنسيق: Conference or Workshop Item
• اللغة: English
• منشور في: 2014
• الوصول للمادة أونلاين: http://www.scopus.com/inward/record.url?eid=2-s2.0-79952607772&partnerID=40&md5=2a090bf380dee8f85db18145aaeaedc1; http://cmuir.cmu.ac.th/handle/6653943832/1481

This paper investigated the ability of the etched wall angle and depth controllable. The silicon plates with a patterned wet film photo resistance as a base substrate are used to demonstrate this research. The reactive ion etching (RIE) is main process for hard disk drive slider fabrication. This pr...