Low temperature, high conductivity Al-doped ZnO film fabrication using modified facing target sputtering

© 2015 Elsevier B.V. Al-doped ZnO films were deposited and characterized for a transparent electrode. To synthesize low temperature and low resistivity films using stronger plasma confinement, modified facing target sputtering was used. The modified process was designed using 2-D magnetic field simu...

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Bibliographic Details
Main Authors: Kim J., Jin S., Wen L., Premphet P., Leksakul K., Han J.
Format: Article
Published: Elsevier 2015
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Online Access:http://www.scopus.com/inward/record.url?partnerID=HzOxMe3b&scp=84929291825&origin=inward
http://cmuir.cmu.ac.th/handle/6653943832/39127
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Institution: Chiang Mai University