Low temperature, high conductivity Al-doped ZnO film fabrication using modified facing target sputtering

• Main Authors: Kim J., Jin S., Wen L., Premphet P., Leksakul K., Han J.
• 格式: Article
• 出版: Elsevier 2015
• 主題: Surfaces, Coatings and Films; Surfaces and Interfaces; Metals and Alloys; Materials Chemistry; Electronic, Optical and Magnetic Materials
• 在線閱讀: http://www.scopus.com/inward/record.url?partnerID=HzOxMe3b&scp=84929291825&origin=inward; http://cmuir.cmu.ac.th/handle/6653943832/39127

© 2015 Elsevier B.V. Al-doped ZnO films were deposited and characterized for a transparent electrode. To synthesize low temperature and low resistivity films using stronger plasma confinement, modified facing target sputtering was used. The modified process was designed using 2-D magnetic field simu...