Low temperature, high conductivity Al-doped ZnO film fabrication using modified facing target sputtering
© 2015 Elsevier B.V. Al-doped ZnO films were deposited and characterized for a transparent electrode. To synthesize low temperature and low resistivity films using stronger plasma confinement, modified facing target sputtering was used. The modified process was designed using 2-D magnetic field simu...
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Main Authors: | Kim J., Jin S., Wen L., Premphet P., Leksakul K., Han J. |
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Format: | Article |
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Elsevier
2015
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Online Access: | http://www.scopus.com/inward/record.url?partnerID=HzOxMe3b&scp=84929291825&origin=inward http://cmuir.cmu.ac.th/handle/6653943832/39127 |
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Institution: | Chiang Mai University |
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