Effect of a low gas pressure plasma treatment on copper substrate used for carbon nanotubes synthesis
© 2016 Effects of two different mixtures of working gas, namely, 10%Ar + 90%H 2 and 10%Ar + 90%N 2 , used in low pressure plasma treatment of copper substrate surface modification in the synthesis of carbon nanotubes by the ACVD method were investigated and compared. After a chemical vapor depositi...
Saved in:
Main Authors: | Suttichart C., Boonyawan D., Nhuapeng W., Thamjaree W. |
---|---|
Format: | Journal |
Published: |
2017
|
Online Access: | https://www.scopus.com/inward/record.uri?partnerID=HzOxMe3b&scp=84979650471&origin=inward http://cmuir.cmu.ac.th/jspui/handle/6653943832/41305 |
Tags: |
Add Tag
No Tags, Be the first to tag this record!
|
Institution: | Chiang Mai University |
Similar Items
-
Effect of a low gas pressure plasma treatment on copper substrate used for carbon nanotubes synthesis
by: C. Suttichart, et al.
Published: (2018) -
Optimization of diamond-like carbon thin film on copper substrate for carbon nanotubes synthesis by ACVD technique
by: Suttichart C., et al.
Published: (2017) -
Optimization of diamond-like carbon thin film on copper substrate for carbon nanotubes synthesis by ACVD technique
by: Chotika Suttichart, et al.
Published: (2018) -
Optimization of diamond-like carbon thin film on copper substrate for carbon nanotubes synthesis by ACVD technique
by: Chotika Suttichart, et al.
Published: (2018) -
Effect of plasma power on copper substrate used for synthesizing carbon nanotubes via Alcohol Catalytic Chemical Vapor Deposition (ACVD) technique
by: Phunwaree S., et al.
Published: (2017)