Effects of filtered cathodic vacuum arc deposition (FCVAD) conditions on photovoltaic TiO2 films

• المؤلفون الرئيسيون: Aramwit C., Intarasiri S., Bootkul D., Tippawan U., Supsermpol B., Seanphinit N., Ruangkul W., Yu L.D.
• التنسيق: مقال
• اللغة: English
• منشور في: Elsevier 2014
• الوصول للمادة أونلاين: http://www.scopus.com/inward/record.url?eid=2-s2.0-84903309650&partnerID=40&md5=6130c4ef285a9c35e5e50f91a6557f74; http://cmuir.cmu.ac.th/handle/6653943832/4744
• المؤسسة: Chiang Mai University

Titanium dioxide (TiO2) films for photovoltaic applications were synthesized using filtered cathodic vacuum arc deposition (FCVAD) technique. Various deposition conditions were tested for an optimal film formation. The conditions included the oxygen (O2) pressure which was varied from a base pressur...