Effects of filtered cathodic vacuum arc deposition (FCVAD) conditions on photovoltaic TiO2 films

• Main Authors: Aramwit C., Intarasiri S., Bootkul D., Tippawan U., Supsermpol B., Seanphinit N., Ruangkul W., Yu L.D.
• 格式: Article
• 語言: English
• 出版: Elsevier 2014
• 在線閱讀: http://www.scopus.com/inward/record.url?eid=2-s2.0-84903309650&partnerID=40&md5=6130c4ef285a9c35e5e50f91a6557f74; http://cmuir.cmu.ac.th/handle/6653943832/4744

Titanium dioxide (TiO2) films for photovoltaic applications were synthesized using filtered cathodic vacuum arc deposition (FCVAD) technique. Various deposition conditions were tested for an optimal film formation. The conditions included the oxygen (O2) pressure which was varied from a base pressur...