Deposition of au, au-v and au-vox on si wafers by co-sputtering technique
Au, Au-V and Au-VOx thin films were deposited on Si wafers by a co-sputtering technique. A fourpoint probe shows that the electrical resistivity of pure Au thin film on Si wafer without annealing is 7.2 m ·cm. The resistivities of thin films deposited on Si wafers, with or without annealing, tended...
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| Main Authors: | , , , , |
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| 格式: | 雜誌 |
| 出版: |
2018
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| 主題: | |
| 在線閱讀: | https://www.scopus.com/inward/record.uri?partnerID=HzOxMe3b&scp=68149152180&origin=inward http://cmuir.cmu.ac.th/jspui/handle/6653943832/49079 |
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| 機構: | Chiang Mai University |