Deposition of au, au-v and au-vox on si wafers by co-sputtering technique

Au, Au-V and Au-VOx thin films were deposited on Si wafers by a co-sputtering technique. A fourpoint probe shows that the electrical resistivity of pure Au thin film on Si wafer without annealing is 7.2 m ·cm. The resistivities of thin films deposited on Si wafers, with or without annealing, tended...

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Bibliographic Details
Main Authors: Narksitipan S., Bannuru T., Brown W.L., Vinci R.P., Thongtem S.
Format: Article
Language:English
Published: 2014
Online Access:http://www.scopus.com/inward/record.url?eid=2-s2.0-68149152180&partnerID=40&md5=5156b586a7d514276222dd385734c377
http://cmuir.cmu.ac.th/handle/6653943832/5835
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Institution: Chiang Mai University
Language: English