Deposition of au, au-v and au-vox on si wafers by co-sputtering technique
Au, Au-V and Au-VOx thin films were deposited on Si wafers by a co-sputtering technique. A fourpoint probe shows that the electrical resistivity of pure Au thin film on Si wafer without annealing is 7.2 m ·cm. The resistivities of thin films deposited on Si wafers, with or without annealing, tended...
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Main Authors: | Narksitipan S., Bannuru T., Brown W.L., Vinci R.P., Thongtem S. |
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Format: | Article |
Language: | English |
Published: |
2014
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Online Access: | http://www.scopus.com/inward/record.url?eid=2-s2.0-68149152180&partnerID=40&md5=5156b586a7d514276222dd385734c377 http://cmuir.cmu.ac.th/handle/6653943832/5835 |
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Institution: | Chiang Mai University |
Language: | English |
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