Surface modification of γ-TiAl alloys by acetylene plasma deposition

Surfaces of two γ-TiAl alloys, Ti-47 at% Al-2at% Nb-2 at% Cr (MJ12) and Ti-47 at% Al-2 at% Nb-2 at% Mn + 0.8 at% TiB2 (MJ47), have been modified by acetylene plasma deposition at bias voltages of -4, -5 and -6 kV for 3.6 × 103 s (1 h) and 1.44 × 104 s (4 h). Knoop hardness (HK) of the alloys is incr...

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Main Authors: Narksitipan S., Thongtem T., McNallan M., Thongtem S.
Format: Article
Language:English
Published: 2014
Online Access:http://www.scopus.com/inward/record.url?eid=2-s2.0-33748980224&partnerID=40&md5=fe49369192b4b2b23e66e3ef25f35812
http://cmuir.cmu.ac.th/handle/6653943832/5066
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Institution: Chiang Mai University
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spelling th-cmuir.6653943832-50662014-08-30T02:56:07Z Surface modification of γ-TiAl alloys by acetylene plasma deposition Narksitipan S. Thongtem T. McNallan M. Thongtem S. Surfaces of two γ-TiAl alloys, Ti-47 at% Al-2at% Nb-2 at% Cr (MJ12) and Ti-47 at% Al-2 at% Nb-2 at% Mn + 0.8 at% TiB2 (MJ47), have been modified by acetylene plasma deposition at bias voltages of -4, -5 and -6 kV for 3.6 × 103 s (1 h) and 1.44 × 104 s (4 h). Knoop hardness (HK) of the alloys is increased with the increase of bias voltage and prolonged time for the deposition. HK of MJ12 and MJ47 deposited at -6 kV for 1.44 × 104 s is, respectively, 3.36 and 3.32 times as hard as the untreated alloys. SEM and AFM analyses show that the deposited alloys compose of a number of nano-dots which reflect their surface properties. The phases analyzed by XRD are in accord with the elements analyzed by EDX. © 2005 Elsevier B.V. All rights reserved. 2014-08-30T02:56:07Z 2014-08-30T02:56:07Z 2006 Article 01694332 10.1016/j.apsusc.2005.11.086 ASUSE http://www.scopus.com/inward/record.url?eid=2-s2.0-33748980224&partnerID=40&md5=fe49369192b4b2b23e66e3ef25f35812 http://cmuir.cmu.ac.th/handle/6653943832/5066 English
institution Chiang Mai University
building Chiang Mai University Library
country Thailand
collection CMU Intellectual Repository
language English
description Surfaces of two γ-TiAl alloys, Ti-47 at% Al-2at% Nb-2 at% Cr (MJ12) and Ti-47 at% Al-2 at% Nb-2 at% Mn + 0.8 at% TiB2 (MJ47), have been modified by acetylene plasma deposition at bias voltages of -4, -5 and -6 kV for 3.6 × 103 s (1 h) and 1.44 × 104 s (4 h). Knoop hardness (HK) of the alloys is increased with the increase of bias voltage and prolonged time for the deposition. HK of MJ12 and MJ47 deposited at -6 kV for 1.44 × 104 s is, respectively, 3.36 and 3.32 times as hard as the untreated alloys. SEM and AFM analyses show that the deposited alloys compose of a number of nano-dots which reflect their surface properties. The phases analyzed by XRD are in accord with the elements analyzed by EDX. © 2005 Elsevier B.V. All rights reserved.
format Article
author Narksitipan S.
Thongtem T.
McNallan M.
Thongtem S.
spellingShingle Narksitipan S.
Thongtem T.
McNallan M.
Thongtem S.
Surface modification of γ-TiAl alloys by acetylene plasma deposition
author_facet Narksitipan S.
Thongtem T.
McNallan M.
Thongtem S.
author_sort Narksitipan S.
title Surface modification of γ-TiAl alloys by acetylene plasma deposition
title_short Surface modification of γ-TiAl alloys by acetylene plasma deposition
title_full Surface modification of γ-TiAl alloys by acetylene plasma deposition
title_fullStr Surface modification of γ-TiAl alloys by acetylene plasma deposition
title_full_unstemmed Surface modification of γ-TiAl alloys by acetylene plasma deposition
title_sort surface modification of γ-tial alloys by acetylene plasma deposition
publishDate 2014
url http://www.scopus.com/inward/record.url?eid=2-s2.0-33748980224&partnerID=40&md5=fe49369192b4b2b23e66e3ef25f35812
http://cmuir.cmu.ac.th/handle/6653943832/5066
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