Filtered cathodic arc deposition with ion-species-selective bias
A dual-cathode arc plasma source was combined with a computer-controlled bias amplifier to synchronize substrate bias with the pulsed production of plasma. In this way, bias can be applied in a material-selective way. The principle has been applied to the synthesis of metal-doped diamondlike carbon...
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th-cmuir.6653943832-52152014-08-30T02:56:16Z Filtered cathodic arc deposition with ion-species-selective bias Anders A. Pasaja N. Sansongsiri S. A dual-cathode arc plasma source was combined with a computer-controlled bias amplifier to synchronize substrate bias with the pulsed production of plasma. In this way, bias can be applied in a material-selective way. The principle has been applied to the synthesis of metal-doped diamondlike carbon films, where the bias was applied and adjusted when the carbon plasma was condensing and the substrate was at ground when the metal was incorporated. In doing so, excessive sputtering by energetic metal ions can be avoided while the s p3 s p2 ratio can be adjusted. It is shown that the resistivity of the film can be tuned by this species-selective bias; Raman spectroscopy was used to confirm expected changes of the amorphous ta-C:Mo films. The species-selective bias principle could be extended to multiple material plasma sources and complex materials. © 2007 American Institute of Physics. 2014-08-30T02:56:16Z 2014-08-30T02:56:16Z 2007 Article 00346748 10.1063/1.2745229 17614620 RSINA http://www.scopus.com/inward/record.url?eid=2-s2.0-34547304981&partnerID=40&md5=7e282998bd3e21c8915c4a61bfb3859f http://cmuir.cmu.ac.th/handle/6653943832/5215 English |
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A dual-cathode arc plasma source was combined with a computer-controlled bias amplifier to synchronize substrate bias with the pulsed production of plasma. In this way, bias can be applied in a material-selective way. The principle has been applied to the synthesis of metal-doped diamondlike carbon films, where the bias was applied and adjusted when the carbon plasma was condensing and the substrate was at ground when the metal was incorporated. In doing so, excessive sputtering by energetic metal ions can be avoided while the s p3 s p2 ratio can be adjusted. It is shown that the resistivity of the film can be tuned by this species-selective bias; Raman spectroscopy was used to confirm expected changes of the amorphous ta-C:Mo films. The species-selective bias principle could be extended to multiple material plasma sources and complex materials. © 2007 American Institute of Physics. |
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Article |
author |
Anders A. Pasaja N. Sansongsiri S. |
spellingShingle |
Anders A. Pasaja N. Sansongsiri S. Filtered cathodic arc deposition with ion-species-selective bias |
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Anders A. Pasaja N. Sansongsiri S. |
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Anders A. |
title |
Filtered cathodic arc deposition with ion-species-selective bias |
title_short |
Filtered cathodic arc deposition with ion-species-selective bias |
title_full |
Filtered cathodic arc deposition with ion-species-selective bias |
title_fullStr |
Filtered cathodic arc deposition with ion-species-selective bias |
title_full_unstemmed |
Filtered cathodic arc deposition with ion-species-selective bias |
title_sort |
filtered cathodic arc deposition with ion-species-selective bias |
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2014 |
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http://www.scopus.com/inward/record.url?eid=2-s2.0-34547304981&partnerID=40&md5=7e282998bd3e21c8915c4a61bfb3859f http://cmuir.cmu.ac.th/handle/6653943832/5215 |
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