Filtered cathodic arc deposition with ion-species-selective bias

A dual-cathode arc plasma source was combined with a computer-controlled bias amplifier to synchronize substrate bias with the pulsed production of plasma. In this way, bias can be applied in a material-selective way. The principle has been applied to the synthesis of metal-doped diamondlike carbon...

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Main Authors: Anders A., Pasaja N., Sansongsiri S.
Format: Article
Language:English
Published: 2014
Online Access:http://www.scopus.com/inward/record.url?eid=2-s2.0-34547304981&partnerID=40&md5=7e282998bd3e21c8915c4a61bfb3859f
http://cmuir.cmu.ac.th/handle/6653943832/5215
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Institution: Chiang Mai University
Language: English
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spelling th-cmuir.6653943832-52152014-08-30T02:56:16Z Filtered cathodic arc deposition with ion-species-selective bias Anders A. Pasaja N. Sansongsiri S. A dual-cathode arc plasma source was combined with a computer-controlled bias amplifier to synchronize substrate bias with the pulsed production of plasma. In this way, bias can be applied in a material-selective way. The principle has been applied to the synthesis of metal-doped diamondlike carbon films, where the bias was applied and adjusted when the carbon plasma was condensing and the substrate was at ground when the metal was incorporated. In doing so, excessive sputtering by energetic metal ions can be avoided while the s p3 s p2 ratio can be adjusted. It is shown that the resistivity of the film can be tuned by this species-selective bias; Raman spectroscopy was used to confirm expected changes of the amorphous ta-C:Mo films. The species-selective bias principle could be extended to multiple material plasma sources and complex materials. © 2007 American Institute of Physics. 2014-08-30T02:56:16Z 2014-08-30T02:56:16Z 2007 Article 00346748 10.1063/1.2745229 17614620 RSINA http://www.scopus.com/inward/record.url?eid=2-s2.0-34547304981&partnerID=40&md5=7e282998bd3e21c8915c4a61bfb3859f http://cmuir.cmu.ac.th/handle/6653943832/5215 English
institution Chiang Mai University
building Chiang Mai University Library
country Thailand
collection CMU Intellectual Repository
language English
description A dual-cathode arc plasma source was combined with a computer-controlled bias amplifier to synchronize substrate bias with the pulsed production of plasma. In this way, bias can be applied in a material-selective way. The principle has been applied to the synthesis of metal-doped diamondlike carbon films, where the bias was applied and adjusted when the carbon plasma was condensing and the substrate was at ground when the metal was incorporated. In doing so, excessive sputtering by energetic metal ions can be avoided while the s p3 s p2 ratio can be adjusted. It is shown that the resistivity of the film can be tuned by this species-selective bias; Raman spectroscopy was used to confirm expected changes of the amorphous ta-C:Mo films. The species-selective bias principle could be extended to multiple material plasma sources and complex materials. © 2007 American Institute of Physics.
format Article
author Anders A.
Pasaja N.
Sansongsiri S.
spellingShingle Anders A.
Pasaja N.
Sansongsiri S.
Filtered cathodic arc deposition with ion-species-selective bias
author_facet Anders A.
Pasaja N.
Sansongsiri S.
author_sort Anders A.
title Filtered cathodic arc deposition with ion-species-selective bias
title_short Filtered cathodic arc deposition with ion-species-selective bias
title_full Filtered cathodic arc deposition with ion-species-selective bias
title_fullStr Filtered cathodic arc deposition with ion-species-selective bias
title_full_unstemmed Filtered cathodic arc deposition with ion-species-selective bias
title_sort filtered cathodic arc deposition with ion-species-selective bias
publishDate 2014
url http://www.scopus.com/inward/record.url?eid=2-s2.0-34547304981&partnerID=40&md5=7e282998bd3e21c8915c4a61bfb3859f
http://cmuir.cmu.ac.th/handle/6653943832/5215
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