MeV-ion beam analysis of the interface between filtered cathodic arc-deposited a-carbon and single crystalline silicon
Amorphous carbon (a-C) films were deposited on Si(1 0 0) wafers by a filtered cathodic vacuum arc (FCVA) plasma source. A negative electrical bias was applied to the silicon substrate in order to control the incident energy of carbon ions. Effects of the electrical bias on the a-C/Si interface chara...
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| Main Authors: | , , , , , |
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| 格式: | 雜誌 |
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2018
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| 在線閱讀: | https://www.scopus.com/inward/record.uri?partnerID=HzOxMe3b&scp=56949104178&origin=inward http://cmuir.cmu.ac.th/jspui/handle/6653943832/60722 |
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| 機構: | Chiang Mai University |