Filtered cathodic arc deposition with ion-species-selective bias

• المؤلفون الرئيسيون: Anders A., Pasaja N., Sansongsiri S.
• التنسيق: مقال
• اللغة: English
• منشور في: 2014
• الوصول للمادة أونلاين: http://www.scopus.com/inward/record.url?eid=2-s2.0-34547304981&partnerID=40&md5=7e282998bd3e21c8915c4a61bfb3859f; http://cmuir.cmu.ac.th/handle/6653943832/5215

A dual-cathode arc plasma source was combined with a computer-controlled bias amplifier to synchronize substrate bias with the pulsed production of plasma. In this way, bias can be applied in a material-selective way. The principle has been applied to the synthesis of metal-doped diamondlike carbon...