Filtered cathodic arc deposition with ion-species-selective bias
A dual-cathode arc plasma source was combined with a computer-controlled bias amplifier to synchronize substrate bias with the pulsed production of plasma. In this way, bias can be applied in a material-selective way. The principle has been applied to the synthesis of metal-doped diamondlike carbon...
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| Main Authors: | , , |
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| 格式: | Article |
| 語言: | English |
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2014
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| 在線閱讀: | http://www.scopus.com/inward/record.url?eid=2-s2.0-34547304981&partnerID=40&md5=7e282998bd3e21c8915c4a61bfb3859f http://cmuir.cmu.ac.th/handle/6653943832/5215 |
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