Plasma polymerization of hexamethyldisiloxane: Investigation of the effect of carrier gas related to the film properties

In this work we present the influence of carrier gases in the deposition of low-pressure discharge plasma of hexamethyldisiloxane (HMDSO). Plasma polymerized HMDSO films were deposited with an inductively-coupled discharge reactor using Ar and O2as carrier gases. The films deposited in Ar contained...

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Main Authors: C. Chaiwong, P. Rachtanapun, S. Sarapirom, D. Boonyawan
格式: 雜誌
出版: 2018
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在線閱讀:https://www.scopus.com/inward/record.uri?partnerID=HzOxMe3b&scp=84880571045&origin=inward
http://cmuir.cmu.ac.th/jspui/handle/6653943832/52381
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