Fabrication of 90° wall of {100} plane on (100) Si by NaOH solution via design of experiments

• المؤلفون الرئيسيون: Chupong Pakpum, Nirut Pussadee
• التنسيق: Book Series
• منشور في: 2018
• الموضوعات: Engineering
• الوصول للمادة أونلاين: https://www.scopus.com/inward/record.uri?partnerID=HzOxMe3b&scp=84898902835&origin=inward; http://cmuir.cmu.ac.th/jspui/handle/6653943832/53545

The experimental trials were conducted by design of experiments (DOE) technique to find an anisotropic wet etching condition that achieves 90° wall angle on silicon (100) orientation wafer. Three considered factors assigned to the DOE were NaOH concentration, solution temperature, and stirring speed...