Investigation of swift heavy I-ion irradiation effects on damage in silicon dioxide thin film
Silicon dioxide (SiO2) is a next-generation dielectric material for semiconductor processing. In particular, a thin film of amorphous-SiO2(a-SiO2) on silicon wafers has many technological applications in microelectronics. However, a-SiO2/Si structures can be severely degraded in the presence of radi...
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| Main Authors: | , , |
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| Format: | Journal |
| Published: |
2018
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| Subjects: | |
| Online Access: | https://www.scopus.com/inward/record.uri?partnerID=HzOxMe3b&scp=84937558982&origin=inward http://cmuir.cmu.ac.th/jspui/handle/6653943832/53951 |
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| Institution: | Chiang Mai University |
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