Utility of dual frequency hybrid source for plasma and radical generation in plasma enhanced chemical vapor deposition process
© 2015 The Japan Society of Applied Physics. Looking into the aspect of material processing, this work evaluates alternative plasma concepts in SiH<inf>4</inf>/H<inf>2</inf> plasmas to investigate the radical and plasma generation in the plasma enhanced chemical vapor deposit...
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| Main Authors: | , , , |
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| 格式: | 雜誌 |
| 出版: |
2018
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| 主題: | |
| 在線閱讀: | https://www.scopus.com/inward/record.uri?partnerID=HzOxMe3b&scp=84933555767&origin=inward http://cmuir.cmu.ac.th/jspui/handle/6653943832/54536 |
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| 機構: | Chiang Mai University |