Low-energy plasma immersion ion implantation to induce DNA transfer into bacterial E. coli
© 2015 Elsevier B.V. Plasma immersion ion implantation (PIII) at low energy was for the first time applied as a novel biotechnology to induce DNA transfer into bacterial cells. Argon or nitrogen PIII at low bias voltages of 2.5, 5 and 10 kV and fluences ranging from 1 × 1012to 1 × 1017ions/cm2treate...
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th-cmuir.6653943832-548582018-09-04T10:25:26Z Low-energy plasma immersion ion implantation to induce DNA transfer into bacterial E. coli K. Sangwijit L. D. Yu S. Sarapirom S. Pitakrattananukool S. Anuntalabhochai Physics and Astronomy © 2015 Elsevier B.V. Plasma immersion ion implantation (PIII) at low energy was for the first time applied as a novel biotechnology to induce DNA transfer into bacterial cells. Argon or nitrogen PIII at low bias voltages of 2.5, 5 and 10 kV and fluences ranging from 1 × 1012to 1 × 1017ions/cm2treated cells of Escherichia coli (E. coli). Subsequently, DNA transfer was operated by mixing the PIII-treated cells with DNA. Successes in PIII-induced DNA transfer were demonstrated by marker gene expressions. The induction of DNA transfer was ion-energy, fluence and DNA-size dependent. The DNA transferred in the cells was confirmed functioning. Mechanisms of the PIII-induced DNA transfer were investigated and discussed in terms of the E. coli cell envelope anatomy. Compared with conventional ion-beam-induced DNA transfer, PIII-induced DNA transfer was simpler with lower cost but higher efficiency. 2018-09-04T10:25:26Z 2018-09-04T10:25:26Z 2015-12-15 Journal 0168583X 2-s2.0-84948575625 10.1016/j.nimb.2015.07.022 https://www.scopus.com/inward/record.uri?partnerID=HzOxMe3b&scp=84948575625&origin=inward http://cmuir.cmu.ac.th/jspui/handle/6653943832/54858 |
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Physics and Astronomy K. Sangwijit L. D. Yu S. Sarapirom S. Pitakrattananukool S. Anuntalabhochai Low-energy plasma immersion ion implantation to induce DNA transfer into bacterial E. coli |
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© 2015 Elsevier B.V. Plasma immersion ion implantation (PIII) at low energy was for the first time applied as a novel biotechnology to induce DNA transfer into bacterial cells. Argon or nitrogen PIII at low bias voltages of 2.5, 5 and 10 kV and fluences ranging from 1 × 1012to 1 × 1017ions/cm2treated cells of Escherichia coli (E. coli). Subsequently, DNA transfer was operated by mixing the PIII-treated cells with DNA. Successes in PIII-induced DNA transfer were demonstrated by marker gene expressions. The induction of DNA transfer was ion-energy, fluence and DNA-size dependent. The DNA transferred in the cells was confirmed functioning. Mechanisms of the PIII-induced DNA transfer were investigated and discussed in terms of the E. coli cell envelope anatomy. Compared with conventional ion-beam-induced DNA transfer, PIII-induced DNA transfer was simpler with lower cost but higher efficiency. |
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Journal |
author |
K. Sangwijit L. D. Yu S. Sarapirom S. Pitakrattananukool S. Anuntalabhochai |
author_facet |
K. Sangwijit L. D. Yu S. Sarapirom S. Pitakrattananukool S. Anuntalabhochai |
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K. Sangwijit |
title |
Low-energy plasma immersion ion implantation to induce DNA transfer into bacterial E. coli |
title_short |
Low-energy plasma immersion ion implantation to induce DNA transfer into bacterial E. coli |
title_full |
Low-energy plasma immersion ion implantation to induce DNA transfer into bacterial E. coli |
title_fullStr |
Low-energy plasma immersion ion implantation to induce DNA transfer into bacterial E. coli |
title_full_unstemmed |
Low-energy plasma immersion ion implantation to induce DNA transfer into bacterial E. coli |
title_sort |
low-energy plasma immersion ion implantation to induce dna transfer into bacterial e. coli |
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2018 |
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https://www.scopus.com/inward/record.uri?partnerID=HzOxMe3b&scp=84948575625&origin=inward http://cmuir.cmu.ac.th/jspui/handle/6653943832/54858 |
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