Influence of plasma process on the nitrogen configuration in graphene

• Main Authors: Sumet Sakulsermsuk, Pisith Singjai, Chanokporn Chaiwong
• Format: Journal
• Published: 2018
• Subjects: Chemistry; Engineering; Materials Science; Physics and Astronomy
• Online Access: https://www.scopus.com/inward/record.uri?partnerID=HzOxMe3b&scp=84994558836&origin=inward; http://cmuir.cmu.ac.th/jspui/handle/6653943832/55433
• Institution: Chiang Mai University

© 2016 Elsevier B.V. We investigated nitrogen doping into graphene on copper substrates by plasma treatment and by plasma immersion ion implantation (PIII). Two nitrogen bonding configurations were discovered to be dominant for distinct plasma processes. Pyridinic-N (P1) was the preferential N-bondi...