MeV-ion beam analysis of the interface between filtered cathodic arc-deposited a-carbon and single crystalline silicon

• المؤلفون الرئيسيون: T. Kamwanna, N. Pasaja, L. D. Yu, T. Vilaithong, A. Anders, S. Singkarat
• التنسيق: دورية
• منشور في: 2018
• الموضوعات: Physics and Astronomy
• الوصول للمادة أونلاين: https://www.scopus.com/inward/record.uri?partnerID=HzOxMe3b&scp=56949104178&origin=inward; http://cmuir.cmu.ac.th/jspui/handle/6653943832/60722

Amorphous carbon (a-C) films were deposited on Si(1 0 0) wafers by a filtered cathodic vacuum arc (FCVA) plasma source. A negative electrical bias was applied to the silicon substrate in order to control the incident energy of carbon ions. Effects of the electrical bias on the a-C/Si interface chara...