Filtered cathodic arc deposition with ion-species-selective bias
A dual-cathode arc plasma source was combined with a computer-controlled bias amplifier to synchronize substrate bias with the pulsed production of plasma. In this way, bias can be applied in a material-selective way. The principle has been applied to the synthesis of metal-doped diamondlike carbon...
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| Main Authors: | , , |
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| Format: | Journal |
| Published: |
2018
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| Subjects: | |
| Online Access: | https://www.scopus.com/inward/record.uri?partnerID=HzOxMe3b&scp=34547304981&origin=inward http://cmuir.cmu.ac.th/jspui/handle/6653943832/61387 |
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| Institution: | Chiang Mai University |
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