Mo-containing tetrahedral amorphous carbon deposited by dual filtered cathodic vacuum arc with selective pulsed bias voltage

Metal-containing tetrahedral amorphous carbon films were produced by dual filtered cathodic vacuum arc plasma sources operated in sequentially pulsed mode. Negatively pulsed bias was applied to the substrate when carbon plasma was generated, whereas it was absent when the molybdenum plasma was prese...

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Main Authors:	Nitisak Pasaja, Sakon Sansongsiri, Saweat Intarasiri, Thiraphat Vilaithong, André Anders
Format:	Journal
Published:	2018
Subjects:	Physics and Astronomy
Online Access:	https://www.scopus.com/inward/record.uri?partnerID=HzOxMe3b&scp=34248680771&origin=inward http://cmuir.cmu.ac.th/jspui/handle/6653943832/61389
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Institution:	Chiang Mai University

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spelling	th-cmuir.6653943832-613892018-09-10T04:10:36Z Mo-containing tetrahedral amorphous carbon deposited by dual filtered cathodic vacuum arc with selective pulsed bias voltage Nitisak Pasaja Sakon Sansongsiri Saweat Intarasiri Thiraphat Vilaithong André Anders Physics and Astronomy Metal-containing tetrahedral amorphous carbon films were produced by dual filtered cathodic vacuum arc plasma sources operated in sequentially pulsed mode. Negatively pulsed bias was applied to the substrate when carbon plasma was generated, whereas it was absent when the molybdenum plasma was presented. Film thickness was measured after deposition by profilometry. Glass slides with silver pads were used as substrates for the measurement of the sheet resistance. The microstructure and composition of the films were characterized by Raman spectroscopy and Rutherford backscattering, respectively. It was found that the electrical resistivity decreases with an increase of the Mo content, which can be ascribed to an increase of the sp2content and an increase of the sp2cluster size. © 2007 Elsevier B.V. All rights reserved. 2018-09-10T04:10:36Z 2018-09-10T04:10:36Z 2007-06-01 Journal 0168583X 2-s2.0-34248680771 10.1016/j.nimb.2007.02.093 https://www.scopus.com/inward/record.uri?partnerID=HzOxMe3b&scp=34248680771&origin=inward http://cmuir.cmu.ac.th/jspui/handle/6653943832/61389
institution	Chiang Mai University
building	Chiang Mai University Library
country	Thailand
collection	CMU Intellectual Repository
topic	Physics and Astronomy
spellingShingle	Physics and Astronomy Nitisak Pasaja Sakon Sansongsiri Saweat Intarasiri Thiraphat Vilaithong André Anders Mo-containing tetrahedral amorphous carbon deposited by dual filtered cathodic vacuum arc with selective pulsed bias voltage
description	Metal-containing tetrahedral amorphous carbon films were produced by dual filtered cathodic vacuum arc plasma sources operated in sequentially pulsed mode. Negatively pulsed bias was applied to the substrate when carbon plasma was generated, whereas it was absent when the molybdenum plasma was presented. Film thickness was measured after deposition by profilometry. Glass slides with silver pads were used as substrates for the measurement of the sheet resistance. The microstructure and composition of the films were characterized by Raman spectroscopy and Rutherford backscattering, respectively. It was found that the electrical resistivity decreases with an increase of the Mo content, which can be ascribed to an increase of the sp2content and an increase of the sp2cluster size. © 2007 Elsevier B.V. All rights reserved.
format	Journal
author	Nitisak Pasaja Sakon Sansongsiri Saweat Intarasiri Thiraphat Vilaithong André Anders
author_facet	Nitisak Pasaja Sakon Sansongsiri Saweat Intarasiri Thiraphat Vilaithong André Anders
author_sort	Nitisak Pasaja
title	Mo-containing tetrahedral amorphous carbon deposited by dual filtered cathodic vacuum arc with selective pulsed bias voltage
title_short	Mo-containing tetrahedral amorphous carbon deposited by dual filtered cathodic vacuum arc with selective pulsed bias voltage
title_full	Mo-containing tetrahedral amorphous carbon deposited by dual filtered cathodic vacuum arc with selective pulsed bias voltage
title_fullStr	Mo-containing tetrahedral amorphous carbon deposited by dual filtered cathodic vacuum arc with selective pulsed bias voltage
title_full_unstemmed	Mo-containing tetrahedral amorphous carbon deposited by dual filtered cathodic vacuum arc with selective pulsed bias voltage
title_sort	mo-containing tetrahedral amorphous carbon deposited by dual filtered cathodic vacuum arc with selective pulsed bias voltage
publishDate	2018
url	https://www.scopus.com/inward/record.uri?partnerID=HzOxMe3b&scp=34248680771&origin=inward http://cmuir.cmu.ac.th/jspui/handle/6653943832/61389
_version_	1681425611538563072

Mo-containing tetrahedral amorphous carbon deposited by dual filtered cathodic vacuum arc with selective pulsed bias voltage

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