Fast and blister-free irradiation conditions for cross-linking of PMMA induced by 2 MeV protons

• Main Authors: Unai S., Puttaraksa N., Pussadee N., Singkarat K., Rhodes M.W., Whitlow H.J., Singkarat S.
• 格式: Conference or Workshop Item
• 語言: English
• 出版: 2014
• 在線閱讀: http://www.scopus.com/inward/record.url?eid=2-s2.0-84869083589&partnerID=40&md5=78a304c96fa9315dbdd5870d7b09fd83; http://cmuir.cmu.ac.th/handle/6653943832/7366
• 機構: Chiang Mai University

For soft lithography, the conventional negative tone resists, such as SU-8, that are used to create the mold have a number of drawbacks. PMMA, which is normally used as a positive tone resist, can be used as a negative resist by using high-fluence irradiation conditions. In this report, we outline o...