Implementation of organic bottom anti-reflective coating in 0.35 μm polycide fabrication

by Ko, T.-M., Fan, M.-H., Cheng, A., Yu, R.
Published 2014

Elimination of 'bottom pinching' effect in environmentally stable chemically amplified resist

by Soo, C.P., Fan, M.H., Bourdillon, A.J., Chan, L.
Published 2014

Improvement on lithography pattern profile by plasma treatment

by Soo, C.P., Bourdillon, A.J., Valiyaveettil, S., Huan, A., Wee, A., Fan, M.H., Ang, T.C., Chan, L.H.
Published 2014

Enhancement or reduction of catalytic dissolution reaction in chemically amplified resists by substrate contaminants

by Soo, C.P., Valiyaveettil, S., Huan, A., Wee, A., Ang, T.C., Fan, M.H., Bourdillon, A.J., Chan, L.H.
Published 2014