Pore sealing by NH3 plasma treatment of porous low dielectric constant films

بواسطة Peng, H.-G., Chi, D.-Z., Wang, W.-D., Li, J.-H., Zeng, K.-Y., Vallery, R.S., Frieze, W.E., Skalsey, M.A., Gidley, D.W., Yee, A.F.
منشور في 2014