Fully silicided NiSi gate on La2O3 MOSFETs

by Lin, C.Y., Ma, M.W., Chin, A., Yeo, Y.C., Zhu, C., Li, M.F., Kwong, D.-L.
Published 2014

A novel program-erasable capacitor using high-κ AlN dielectric

by Lai, C.H., Ma, M.W., Cheng, C.F., Chin, A., McAlister, S.P., Zhu, C.X., Li, M.-F., Kwong, D.L.
Published 2014