Reliability analysis of thin HfO2/SiO2 gate dielectric stack

by Samanta, P., Zhu, C., Chan, M.
Published 2014

Charge carrier generation/trapping mechanisms in HfO2/SiO2 stack

by Samanta, P., Zhu, C., Chan, M.
Published 2014

Comparison of electrical stress-induced charge carrier generation/trapping and related degradation of SiO2 and HfO2/SiO2 gate dielectric stacks

by Samanta, P., Zhu, C., Chan, M.
Published 2014

On the electrical stress-induced oxide-trapped charges in thin Hf O2 Si O2 gate dielectric stack

by Samanta, P., Zhu, C., Chan, M.
Published 2014

Direct tunneling stress-induced leakage current in ultrathin HfO 2SiO2 gate dielectric stacks

by Samanta, P., Man, T.Y., Zhang, Q., Zhu, C., Chan, M.
Published 2014

Direct tunneling stress-induced leakage current in NMOS devices with ultrathin gate oxides

by Samanta, P., Man, T.Y., Chan, A.C.K., Zhang, Q., Zhu, C., Chan, M.
Published 2014

Experimental evidence of two conduction mechanisms for direct tunnelling stress-induced leakage current through ultrathin silicon dioxide gate dielectrics

by Samanta, P., Man, T.Y., Chan, A.C.K., Zhang, Q., Zhu, C., Chan, M.
Published 2014