Resist trimming in high-density CF4/O2 plasmas for sub-0.1 μm device fabrication

by Sin, C.-Y., Chen, B.-H., Loh, W.L., Yu, J., Yelehanka, P., See, A., Chan, L.
Published 2014

Effect of halogen in high-density oxygen plasmas on photoresist trimming

by Sin, C.-Y., Chen, B.-H., Loh, W.L., Yu, J., Yelehanka, P., See, A., Chan, L.
Published 2014

Angled XPS analysis of low-k dielectric surfaces after cleaning

by Tan, Y.S., Chooi, S.Y.M., Sin, C.-Y., Ee, P.-Y., Srinivasan, M.P., Pehkonen, S.O.
Published 2014

Characterization of low-k dielectric trench surface cleaning after a fluorocarbon etch

by Tan, Y.S., Chooi, S.Y.M., Sin, C.-Y., Ee, P.-Y., Srinivasan, M.P., Pehkonen, S.O.
Published 2014