Characterization of low-k dielectric trench surface cleaning after a fluorocarbon etch

• Main Authors: Tan, Y.S., Chooi, S.Y.M., Sin, C.-Y., Ee, P.-Y., Srinivasan, M.P., Pehkonen, S.O.
• 其他作者: CHEMICAL & BIOMOLECULAR ENGINEERING
• 格式: Article
• 出版: 2014
• 主題: Cleaning; Contamination; Low-k dielectric; X-ray photoelectron spectroscopy
• 在線閱讀: http://scholarbank.nus.edu.sg/handle/10635/88637

10.1016/j.tsf.2004.05.053