Characterization of low-k dielectric trench surface cleaning after a fluorocarbon etch
10.1016/j.tsf.2004.05.053
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2014
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sg-nus-scholar.10635-886372024-11-11T03:18:50Z Characterization of low-k dielectric trench surface cleaning after a fluorocarbon etch Tan, Y.S. Chooi, S.Y.M. Sin, C.-Y. Ee, P.-Y. Srinivasan, M.P. Pehkonen, S.O. CHEMICAL & BIOMOLECULAR ENGINEERING Cleaning Contamination Low-k dielectric X-ray photoelectron spectroscopy 10.1016/j.tsf.2004.05.053 Thin Solid Films 462-463 SPEC. ISS. 250-256 THSFA 2014-10-09T06:44:33Z 2014-10-09T06:44:33Z 2004-09 Article Tan, Y.S., Chooi, S.Y.M., Sin, C.-Y., Ee, P.-Y., Srinivasan, M.P., Pehkonen, S.O. (2004-09). Characterization of low-k dielectric trench surface cleaning after a fluorocarbon etch. Thin Solid Films 462-463 (SPEC. ISS.) : 250-256. ScholarBank@NUS Repository. https://doi.org/10.1016/j.tsf.2004.05.053 00406090 http://scholarbank.nus.edu.sg/handle/10635/88637 000223812800052 Scopus |
| institution |
National University of Singapore |
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NUS Library |
| continent |
Asia |
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Singapore Singapore |
| content_provider |
NUS Library |
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ScholarBank@NUS |
| topic |
Cleaning Contamination Low-k dielectric X-ray photoelectron spectroscopy |
| spellingShingle |
Cleaning Contamination Low-k dielectric X-ray photoelectron spectroscopy Tan, Y.S. Chooi, S.Y.M. Sin, C.-Y. Ee, P.-Y. Srinivasan, M.P. Pehkonen, S.O. Characterization of low-k dielectric trench surface cleaning after a fluorocarbon etch |
| description |
10.1016/j.tsf.2004.05.053 |
| author2 |
CHEMICAL & BIOMOLECULAR ENGINEERING |
| author_facet |
CHEMICAL & BIOMOLECULAR ENGINEERING Tan, Y.S. Chooi, S.Y.M. Sin, C.-Y. Ee, P.-Y. Srinivasan, M.P. Pehkonen, S.O. |
| format |
Article |
| author |
Tan, Y.S. Chooi, S.Y.M. Sin, C.-Y. Ee, P.-Y. Srinivasan, M.P. Pehkonen, S.O. |
| author_sort |
Tan, Y.S. |
| title |
Characterization of low-k dielectric trench surface cleaning after a fluorocarbon etch |
| title_short |
Characterization of low-k dielectric trench surface cleaning after a fluorocarbon etch |
| title_full |
Characterization of low-k dielectric trench surface cleaning after a fluorocarbon etch |
| title_fullStr |
Characterization of low-k dielectric trench surface cleaning after a fluorocarbon etch |
| title_full_unstemmed |
Characterization of low-k dielectric trench surface cleaning after a fluorocarbon etch |
| title_sort |
characterization of low-k dielectric trench surface cleaning after a fluorocarbon etch |
| publishDate |
2014 |
| url |
http://scholarbank.nus.edu.sg/handle/10635/88637 |
| _version_ |
1821198666128424960 |