Characterization of low-k dielectric trench surface cleaning after a fluorocarbon etch

Characterization of low-k dielectric trench surface cleaning after a fluorocarbon etch

10.1016/j.tsf.2004.05.053

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Bibliographic Details
Main Authors: Tan, Y.S., Chooi, S.Y.M., Sin, C.-Y., Ee, P.-Y., Srinivasan, M.P., Pehkonen, S.O.
Other Authors: CHEMICAL & BIOMOLECULAR ENGINEERING
Format: Article
Published: 2014
Subjects:
Cleaning
Contamination
Low-k dielectric
X-ray photoelectron spectroscopy
Online Access:http://scholarbank.nus.edu.sg/handle/10635/88637
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Institution: National University of Singapore

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