Effects of chemical slurries on fixed abrasive chemical-mechanical polishing of optical silicon substrates

by Tian, Yebing, Zhong, Zhaowei, Ng, Jun Hao
Published 2016

An analytical investigation of pad wear caused by the conditioner in fixed abrasive chemical–mechanical polishing

by Nguyen, N. Y., Zhong, Zhao Wei, Tian, Yebing
Published 2016

Modeling and simulation for the distribution of slurry particles in chemical mechanical polishing

by Nguyen, N. Y., Tian, Yebing, Zhong, Zhao Wei
Published 2016