Effects of chemical slurries on fixed abrasive chemical-mechanical polishing of optical silicon substrates

بواسطة Tian, Yebing, Zhong, Zhaowei, Ng, Jun Hao
منشور في 2016

An analytical investigation of pad wear caused by the conditioner in fixed abrasive chemical–mechanical polishing

بواسطة Nguyen, N. Y., Zhong, Zhao Wei, Tian, Yebing
منشور في 2016

Modeling and simulation for the distribution of slurry particles in chemical mechanical polishing

بواسطة Nguyen, N. Y., Tian, Yebing, Zhong, Zhao Wei
منشور في 2016