Resolution performance of programmable proximity aperture MeV ion beam lithography system

by Sergey Gorelick, Timo Sajavaara, Mikko Laitinen, Nitipon Puttaraksa, Harry J. Whitlow
Published 2018

Lithography exposure characteristics of poly(methyl methacrylate) (PMMA) for carbon, helium and hydrogen ions

by Nitipon Puttaraksa, Rattanaporn Norarat, Mikko Laitinen, Timo Sajavaara, Somsorn Singkarat, Harry J. Whitlow
Published 2018

Programmable proximity aperture lithography with MeV ion beams

by Nitipon Puttaraksa, Sergey Gorelick, Timo Sajavaara, Mikko Laitinen, Somsorn Singkarat, Harry J. Whitlow
Published 2018

Direct writing of channels for microfluidics in silica by MeV ion beam lithography

by Nitipon Puttaraksa, Mari Napari, Orapin Chienthavorn, Rattanaporn Norarat, Timo Sajavaara, Mikko Laitinen, Somsorn Singkarat, Harry J. Whitlow
Published 2018