Resolution performance of programmable proximity aperture MeV ion beam lithography system
An ion beam lithography system for light and heavy ions has been developed at the University of Jyväskylä's Accelerator Laboratory. The system employs a programmable proximity aperture to define the beam. The proximity aperture is made up of four Ta blades with precise straight edges that cut t...
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| Main Authors: | , , , , |
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| 格式: | Conference Proceeding |
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2018
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| 主題: | |
| 在線閱讀: | https://www.scopus.com/inward/record.uri?partnerID=HzOxMe3b&scp=44449089706&origin=inward http://cmuir.cmu.ac.th/jspui/handle/6653943832/61066 |
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| 機構: | Chiang Mai University |