Resolution performance of programmable proximity aperture MeV ion beam lithography system

• المؤلفون الرئيسيون: Sergey Gorelick, Timo Sajavaara, Mikko Laitinen, Nitipon Puttaraksa, Harry J. Whitlow
• التنسيق: وقائع المؤتمر
• منشور في: 2018
• الموضوعات: Engineering; Materials Science; Physics and Astronomy
• الوصول للمادة أونلاين: https://www.scopus.com/inward/record.uri?partnerID=HzOxMe3b&scp=44449089706&origin=inward; http://cmuir.cmu.ac.th/jspui/handle/6653943832/61066
• المؤسسة: Chiang Mai University

An ion beam lithography system for light and heavy ions has been developed at the University of Jyväskylä's Accelerator Laboratory. The system employs a programmable proximity aperture to define the beam. The proximity aperture is made up of four Ta blades with precise straight edges that cut t...