Resolution performance of programmable proximity aperture MeV ion beam lithography system

An ion beam lithography system for light and heavy ions has been developed at the University of Jyväskylä's Accelerator Laboratory. The system employs a programmable proximity aperture to define the beam. The proximity aperture is made up of four Ta blades with precise straight edges that cut t...

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Bibliographic Details
Main Authors: Sergey Gorelick, Timo Sajavaara, Mikko Laitinen, Nitipon Puttaraksa, Harry J. Whitlow
Format: Conference Proceeding
Published: 2018
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Online Access:https://www.scopus.com/inward/record.uri?partnerID=HzOxMe3b&scp=44449089706&origin=inward
http://cmuir.cmu.ac.th/jspui/handle/6653943832/61066
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Institution: Chiang Mai University